lithography Archives - Particle Measuring Systems https://www.pmeasuring.com/tag/lithography-zh-tw/ Contamination control instruments and expertise Thu, 09 Jan 2025 21:04:36 +0000 en-US hourly 1 https://wordpress.org/?v=6.7.2 https://www.pmeasuring.com/wp-content/uploads/2018/12/cropped-pms-icon-1-150x150.png lithography Archives - Particle Measuring Systems https://www.pmeasuring.com/tag/lithography-zh-tw/ 32 32 Airborne Molecular Contamination Application in Precision Optical Component and Sub-System Manufacturing https://www.pmeasuring.com/airborne-molecular-contamination-monitoring-amc-precision-optics/ Wed, 19 May 2021 15:00:58 +0000 https://www.pmeasuring.com/?p=96348 The 24/7 real-time POU analyzers sampling scheme is part of the comprehensive AMC control plan to deliver lenses of optimal performance to litho and Metrology Tools OEMs.

The post Airborne Molecular Contamination Application in Precision Optical Component and Sub-System Manufacturing appeared first on Particle Measuring Systems.

]]> Airborne Molecular Contamination (AMC) Control in Precision Optical Lens Manufacturing https://www.pmeasuring.com/airborne-molecular-contamination-control-precision-optics/ Wed, 12 May 2021 15:00:19 +0000 https://www.pmeasuring.com/?p=96317 Real-time AMC monitoring in the optical component and sub-system manufacturing facility becomes a leading indicator of effective quality and reliability of the component and sub-system.

The post Airborne Molecular Contamination (AMC) Control in Precision Optical Lens Manufacturing appeared first on Particle Measuring Systems.

]]> Lithography Defects Caused by AMC (Airborne Molecular Contamination) in the Functional Area https://www.pmeasuring.com/amc-lithography-defects-functional-area/ Wed, 05 May 2021 15:00:36 +0000 https://www.pmeasuring.com/?p=96260 There is a need for more control of deleterious environmental contamination, including better detection and real-time response to undesired AMC concentration levels, the most prevalent of which are the amines class of AMCs.

The post Lithography Defects Caused by AMC (Airborne Molecular Contamination) in the Functional Area appeared first on Particle Measuring Systems.

]]> AMC Contamination – Caused Optical Haze Formation https://www.pmeasuring.com/amc-contamination-optical-haze-formation-surfaces/ Wed, 28 Apr 2021 15:00:06 +0000 https://www.pmeasuring.com/?p=96228 A major objective in eliminating defects in these processes involves preventing the formation of haze on mirrors, lenses, masks, reticles, prisms and other optical components.

The post AMC Contamination – Caused Optical Haze Formation appeared first on Particle Measuring Systems.

]]> Real-Time AMC Monitoring in Lithography to Prevent Defects https://www.pmeasuring.com/real-time-amc-monitoring-to-prevent-defects/ Wed, 21 Apr 2021 15:00:45 +0000 https://www.pmeasuring.com/?p=96141 The successful implementation of advanced litho techniques has meant that the roadmap’s major challenges are no longer resolution dependent...

The post Real-Time AMC Monitoring in Lithography to Prevent Defects appeared first on Particle Measuring Systems.

]]>