microelectronics Archives - Particle Measuring Systems

Airborne Molecular Contamination Application in Precision Optical Component and Sub-System Manufacturing

Nina Morton — Wed, 19 May 2021 15:00:58 +0000

The 24/7 real-time POU analyzers sampling scheme is part of the comprehensive AMC control plan to deliver lenses of optimal performance to litho and Metrology Tools OEMs.

The post Airborne Molecular Contamination Application in Precision Optical Component and Sub-System Manufacturing appeared first on Particle Measuring Systems.

Airborne Molecular Contamination (AMC) Control in Precision Optical Lens Manufacturing

Nina Morton — Wed, 12 May 2021 15:00:19 +0000

Real-time AMC monitoring in the optical component and sub-system manufacturing facility becomes a leading indicator of effective quality and reliability of the component and sub-system.

The post Airborne Molecular Contamination (AMC) Control in Precision Optical Lens Manufacturing appeared first on Particle Measuring Systems.

AMC Contamination – Caused Optical Haze Formation

Nina Morton — Wed, 28 Apr 2021 15:00:06 +0000

A major objective in eliminating defects in these processes involves preventing the formation of haze on mirrors, lenses, masks, reticles, prisms and other optical components.

The post AMC Contamination – Caused Optical Haze Formation appeared first on Particle Measuring Systems.

Particle Counting to 20 nm with the SLS-20 Chemical Batch Sampler

Nina Morton — Wed, 17 Feb 2021 15:30:58 +0000

In this blog series, we introduce the most sensitive system for detecting contamination in microelectronic applications. Through several rigorous studies, we demonstrate the veracity and reliability of data collection for various process chemicals.

The post Particle Counting to 20 nm with the SLS-20 Chemical Batch Sampler appeared first on Particle Measuring Systems.

Chemical Particle Batch Sampling to 20 nm with the SLS-20 Batch Sampler

Nina Morton — Wed, 10 Feb 2021 15:30:52 +0000

The post Chemical Particle Batch Sampling to 20 nm with the SLS-20 Batch Sampler appeared first on Particle Measuring Systems.

Effective Chemical Batch Sampling Down to 20 nm with the SLS-20 Batch Sampler

Nina Morton — Wed, 27 Jan 2021 15:30:41 +0000

The post Effective Chemical Batch Sampling Down to 20 nm with the SLS-20 Batch Sampler appeared first on Particle Measuring Systems.

Batch Sampling Down to 20 nm with the SLS-20: What’s New

Nina Morton — Sat, 23 Jan 2021 15:30:03 +0000

The post Batch Sampling Down to 20 nm with the SLS-20: What’s New appeared first on Particle Measuring Systems.